KVR-2000 Series > RTP
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제품 정보
제품 상세설명
Overview
Rapid Thermal Processing (RTP) refer to a semiconductor manufacturing process which
instantly heats silicon wafer to high temperatures (up to 1100℃ / 2012℉) under
different atmospheric conditions such as oxygen or nitrogen.
The Korea Vacuum Tech, Ltd. RTP System offers the highest Rapid Thermal Annealing
(RTA) performance for a wide range of application with a low cost of ownership.
Designed to meet the most stringent requirements of today’s semiconductor
technologies and beyond, the RTP Module provides complete temperature control
necessary for advanced semiconductor manufacturing applications.
The Korea Vacuum Tech, Ltd. RTP system utilizes and array of unique technical feature
which provide optimal uniformity, repeatability and precision previously unachievable in
semiconductor manufacturing.
Features
≻ High-power Quartz Lamps
Wafers are heated by an array of high-power quartz lamps.
≻ Rapid Heating
The maximum heating rate of the wafer is 100℃/ sec (212℉/sec).
≻ Digital display shows both the actual wafer temperature as well as the desired pre-set temperature
PID constants can be easily set by the standard equipment auto-tuning function.
≻ Variable Pressure Range
Pressure ranges from high vacuum to ambient atmospheres with oxygen or nitrogen can be utilized.
≻ Compatible with various gases (Ar, H2, O2, N2)
Applications
≻ Silicide to Si process
≻ Annealing after ion implantation: sheet resistance
≻ LED process such as GaN
Overview
Rapid Thermal Processing (RTP) refer to a semiconductor manufacturing process which
instantly heats silicon wafer to high temperatures (up to 1100℃ / 2012℉) under
different atmospheric conditions such as oxygen or nitrogen.
The Korea Vacuum Tech, Ltd. RTP System offers the highest Rapid Thermal Annealing
(RTA) performance for a wide range of application with a low cost of ownership.
Designed to meet the most stringent requirements of today’s semiconductor
technologies and beyond, the RTP Module provides complete temperature control
necessary for advanced semiconductor manufacturing applications.
The Korea Vacuum Tech, Ltd. RTP system utilizes and array of unique technical feature
which provide optimal uniformity, repeatability and precision previously unachievable in
semiconductor manufacturing.
Features
≻ High-power Quartz Lamps
Wafers are heated by an array of high-power quartz lamps.
≻ Rapid Heating
The maximum heating rate of the wafer is 100℃/ sec (212℉/sec).
≻ Digital display shows both the actual wafer temperature as well as the desired pre-set temperature
PID constants can be easily set by the standard equipment auto-tuning function.
≻ Variable Pressure Range
Pressure ranges from high vacuum to ambient atmospheres with oxygen or nitrogen can be utilized.
≻ Compatible with various gases (Ar, H2, O2, N2)
Applications
≻ Silicide to Si process
≻ Annealing after ion implantation: sheet resistance
≻ LED process such as GaN
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Specifications
제품 Specifications
Specifications
ITEM
SPECIFICATION
Substrate size
2” wafer
Substrate holder
2.5” SiC
Heating elements
Quartz Lamp
Chamber Material
Water or air cooled Al or SUS304 chamber
with quartz window
Pumping system:
Rotary pump
Gas control:
Mass Flow Meter or MFC
Specifications
ITEM
SPECIFICATION
Substrate size
2” wafer
Substrate holder
2.5” SiC
Heating elements
Quartz Lamp
Chamber Material
Water or air cooled Al or SUS304 chamber
with quartz window
Pumping system:
Rotary pump
Gas control:
Mass Flow Meter or MFC
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Options
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Control
제품 Control
System Control
Pumping
This picture is a pumping screen. There are buttons on the screen to operate the pump and valve to keep the chamber under vacuum. In addition, MFC and throttle valves are controlled to create a process environment within the chamber.
Recipe
The figure shows the recipe screen. This screen contains boxes for entering the process conditions required for deposition. Input all the boxes and press the Process button to automatically deposit according to the input process conditions.
Graph
The figure shows the graph screen. This screen shows vacuum degree, power amount, Temperature and so on. You can record that data and make it into a file and compare it with the previous data.
System Control
Pumping
This picture is a pumping screen. There are buttons on the screen to operate the pump and valve to keep the chamber under vacuum. In addition, MFC and throttle valves are controlled to create a process environment within the chamber.
Recipe
The figure shows the recipe screen. This screen contains boxes for entering the process conditions required for deposition. Input all the boxes and press the Process button to automatically deposit according to the input process conditions.
Graph
The figure shows the graph screen. This screen shows vacuum degree, power amount, Temperature and so on. You can record that data and make it into a file and compare it with the previous data.
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사용후기
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상품문의
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배송/교환정보
[배송]
배송 안내 입력전입니다.[교환]
교환/반품 안내 입력전입니다.
선택된 옵션
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KVR-2000 Series+0원
