The Perfect Solution for Next-Generation Advanced Materials Research: Glove Box Integrated Sputter System
It completely blocks oxygen and moisture, setting a new standard for high-quality thin film deposition.
For the research and production of next-generation advanced materials sensitive to the atmosphere, an environment with perfectly controlled oxygen (O₂) and moisture (H₂O) is essential. The 'Glove Box Integrated Sputter System' is a state-of-the-art hybrid solution that integrates a glove box, which maintains a high-purity inert gas environment, with sputtering equipment capable of high-precision thin film deposition.
It maximizes the reliability of research results by allowing sample preparation, deposition, and post-processing to proceed without exposure to the atmosphere.
Key Features
• Maintaining a Perfectly Inert Environment (Air-Free Environment) by precisely controlling oxygen and moisture concentrations inside the glove box to less than 1 ppm, it safely protects sensitive samples that would oxidize or degrade upon exposure to the atmosphere.
• Damage-Free Direct Transfer: Direct transfer from the glove box to the vacuum chamber is possible, effectively preventing contamination that can occur during movement between equipment. Samples can be loaded directly from inside the glove box into the sputter chamber, significantly increasing process efficiency.
• High-Quality and High-Precision Thin Film Deposition: High-quality and high-precision thin film deposition is achieved through a superior sputtering process. Supporting various power supplies such as DC, RF, and medium frequency (MF), coating is possible on a wide range of target materials including metals, insulators, and oxides, while ensuring excellent thickness uniformity and reproducibility.
• Customizable Design: The chamber size, number of target guns, heating functions, and the presence or absence of a load-lock system can be flexibly customized to suit research objectives and available space.
Key Applications
This system is optimized for research and development and pilot production in high-tech industries critical to airborne moisture or oxygen.
1. Next-Gen Batteries: Research on lithium-ion battery materials, coating of solid electrolytes and lithium metal anodes for all-solid-state batteries
2. Next-Gen Displays: Deposition of OLED and Micro-LED light-emitting layers and electrodes, research on moisture-blocking encapsulation thin films
3. High-Efficiency Solar Cells: Development of atmosphere-sensitive optoelectronic devices such as perovskite solar cells
4. Nano & Flexible Electronics: Fabrication of organic semiconductors, 2D nanomaterials, and various sensitive sensors
Create innovative results with a glove box-integrated sputtering system that delivers precision beyond the limits of research.
The Perfect Solution for Next-Generation Advanced Materials Research: Glove Box Integrated Sputter System
It completely blocks oxygen and moisture, setting a new standard for high-quality thin film deposition.
For the research and production of next-generation advanced materials sensitive to the atmosphere, an environment with perfectly controlled oxygen (O₂) and moisture (H₂O) is essential. The 'Glove Box Integrated Sputter System' is a state-of-the-art hybrid solution that integrates a glove box, which maintains a high-purity inert gas environment, with sputtering equipment capable of high-precision thin film deposition.
It maximizes the reliability of research results by allowing sample preparation, deposition, and post-processing to proceed without exposure to the atmosphere.
Key Features
• Maintaining a Perfectly Inert Environment (Air-Free Environment) by precisely controlling oxygen and moisture concentrations inside the glove box to less than 1 ppm, it safely protects sensitive samples that would oxidize or degrade upon exposure to the atmosphere.
• Damage-Free Direct Transfer: Direct transfer from the glove box to the vacuum chamber is possible, effectively preventing contamination that can occur during movement between equipment. Samples can be loaded directly from inside the glove box into the sputter chamber, significantly increasing process efficiency.
• High-Quality and High-Precision Thin Film Deposition: High-quality and high-precision thin film deposition is achieved through a superior sputtering process. Supporting various power supplies such as DC, RF, and medium frequency (MF), coating is possible on a wide range of target materials including metals, insulators, and oxides, while ensuring excellent thickness uniformity and reproducibility.
• Customizable Design: The chamber size, number of target guns, heating functions, and the presence or absence of a load-lock system can be flexibly customized to suit research objectives and available space.
Key Applications
This system is optimized for research and development and pilot production in high-tech industries critical to airborne moisture or oxygen.
1. Next-Gen Batteries: Research on lithium-ion battery materials, coating of solid electrolytes and lithium metal anodes for all-solid-state batteries
2. Next-Gen Displays: Deposition of OLED and Micro-LED light-emitting layers and electrodes, research on moisture-blocking encapsulation thin films
3. High-Efficiency Solar Cells: Development of atmosphere-sensitive optoelectronic devices such as perovskite solar cells
4. Nano & Flexible Electronics: Fabrication of organic semiconductors, 2D nanomaterials, and various sensitive sensors
Create innovative results with a glove box-integrated sputtering system that delivers precision beyond the limits of research.
For further inquiries, please contact our company.
For further inquiries, please contact our company.
For further inquiries, please contact our company.
For further inquiries, please contact our company.
For further inquiries, please contact our company.
For further inquiries, please contact our company.
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