Multi-function PVD System > Multi-function System
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제품 정보
제품 상세설명
Overview
A New Standard for Precision Alloy and Composite Multilayer Thin Film Processing: Multi-Function PVD System
Overcoming the limitations of single deposition processes, this is a perfectly integrated solution for advanced device research requiring the highest thin film quality and interfacial properties. This system integrates a Magnetron Sputter, excellent for alloy deposition, and an Electron Beam Evaporator, advantageous for forming high-purity thin films, into a single high-vacuum chamber.
In particular, it is optimized for research on composite multilayer thin films requiring precise electrical characteristics. Through an in-situ process that performs two deposition processes consecutively without atmospheric exposure (vacuum breakdown), researchers can realize the highest quality electronic devices completely free from oxidation and interfacial contamination.
Overview
A New Standard for Precision Alloy and Composite Multilayer Thin Film Processing: Multi-Function PVD System
Overcoming the limitations of single deposition processes, this is a perfectly integrated solution for advanced device research requiring the highest thin film quality and interfacial properties. This system integrates a Magnetron Sputter, excellent for alloy deposition, and an Electron Beam Evaporator, advantageous for forming high-purity thin films, into a single high-vacuum chamber.
In particular, it is optimized for research on composite multilayer thin films requiring precise electrical characteristics. Through an in-situ process that performs two deposition processes consecutively without atmospheric exposure (vacuum breakdown), researchers can realize the highest quality electronic devices completely free from oxidation and interfacial contamination.
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Specifications
제품 Specifications
Specifications
ITEM
SPECIFICATIONS
Process Chamber
Stainless steel
Vacuum Pumping Station
Turbo molecular pump
Loadlock Chamber
Stainless steel
Substrate Heating Unit
SiC / 4”, 6”
Sample Loading/Unloading Unit
Full auto / Semi-auto
Pressure Control Unit
Automatic
Vacuum Gauge Controller
ATM ~ 1.0E-10Torr
Gas Supply Unit
MFC (Ar, O2, N2, H2, etc..)
Power Supply Unit
E-Beam, RF / DC / Pulsed DC
Target Size
2”
Film Thickness Uniformity
Less than ± 2.99 %
Ultimate Pressure
Less than 1.99E-7 Torr / 1 Hour (Process Chamber)
Less than 4.99E-3 Torr / 1 Hour (loadlock Chamber)
CE Certification Acquired Specifications
ITEM
SPECIFICATIONS
Process Chamber
Stainless steel
Vacuum Pumping Station
Turbo molecular pump
Loadlock Chamber
Stainless steel
Substrate Heating Unit
SiC / 4”, 6”
Sample Loading/Unloading Unit
Full auto / Semi-auto
Pressure Control Unit
Automatic
Vacuum Gauge Controller
ATM ~ 1.0E-10Torr
Gas Supply Unit
MFC (Ar, O2, N2, H2, etc..)
Power Supply Unit
E-Beam, RF / DC / Pulsed DC
Target Size
2”
Film Thickness Uniformity
Less than ± 2.99 %
Ultimate Pressure
Less than 1.99E-7 Torr / 1 Hour (Process Chamber)
Less than 4.99E-3 Torr / 1 Hour (loadlock Chamber)
CE Certification Acquired -
Options
제품 Options
Options
- Etc... user requirements
Options
- Etc... user requirements
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Control
제품 Control
System Control
- Automatic Control
System Control
- Automatic Control
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사용후기
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상품문의
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배송/교환정보
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배송 안내 입력전입니다.[교환]
교환/반품 안내 입력전입니다.
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Multi-function PVD System+0원
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