A New Standard for Precision Alloy and Composite Multilayer Thin Film Processing: Multi-Function PVD System

Overcoming the limitations of single deposition processes, this is a perfectly integrated solution for advanced device research requiring the highest thin film quality and interfacial properties. This system integrates a Magnetron Sputter, excellent for alloy deposition, and an Electron Beam Evaporator, advantageous for forming high-purity thin films, into a single high-vacuum chamber.

In particular, it is optimized for research on composite multilayer thin films requiring precise electrical characteristics. Through an in-situ process that performs two deposition processes consecutively without atmospheric exposure (vacuum breakdown), researchers can realize the highest quality electronic devices completely free from oxidation and interfacial contamination.

For further inquiries, please contact our company.

For further inquiries, please contact our company.

For further inquiries, please contact our company.