Overview
Korea Vacuum Tech, Ltd. (KVT) is proud to introduce the latest revolutionary addition to
our product line, the Intelsi-M Multi-Function PVD system. Despite its compact
convenient size, easy operation and affordability, functionality is in no way sacrificed.
The Intelsi-M is capable of thin film deposition utilizing Sputter, E-Beam and Thermal
Source technologies and can accommodate variable material types in sample sizes up to
4" (101.2mm). The modular design of the Intelsi-M makes it highly configurable to meet
specific customer needs and numerous stock options are also available. A fully
automated Laptop PC helps round out this extremely usable yet robust diminutive
package.
Advantages
≻ Easy to install, easy to operate
≻ Precise reproducible coatings - consistent
≻ Fully adaptable to a wide range of specimens
≻ Compact design / small footprint
≻ Quick and simple loading / unloading
Features
≻ Extreme versatility
≻ High capacity vacuum pumping
≻ Fully automated PC control
≻ Capable of producing very thin resultant films
Overview
Korea Vacuum Tech, Ltd. (KVT) is proud to introduce the latest revolutionary addition to
our product line, the Intelsi-M Multi-Function PVD system. Despite its compact
convenient size, easy operation and affordability, functionality is in no way sacrificed.
The Intelsi-M is capable of thin film deposition utilizing Sputter, E-Beam and Thermal
Source technologies and can accommodate variable material types in sample sizes up to
4" (101.2mm). The modular design of the Intelsi-M makes it highly configurable to meet
specific customer needs and numerous stock options are also available. A fully
automated Laptop PC helps round out this extremely usable yet robust diminutive
package.
Advantages
≻ Easy to install, easy to operate
≻ Precise reproducible coatings - consistent
≻ Fully adaptable to a wide range of specimens
≻ Compact design / small footprint
≻ Quick and simple loading / unloading
Features
≻ Extreme versatility
≻ High capacity vacuum pumping
≻ Fully automated PC control
≻ Capable of producing very thin resultant films
Specifications
ITEM |
SPECIFICATIONS |
Process Chamber |
Stainless steel |
Vacuum Pumping Station |
Turbo molecular pump |
Loadlock Chamber |
Stainless steel |
Substrate Heating Unit |
SiC / 4” |
Sample Loading/Unloading Unit |
Manual |
Pressure Control Unit |
Auto |
Vacuum Gauge Controller |
ATM ~ 1.0E-10Torr |
Gas Supply Unit |
MFC (Ar, O2, etc..) |
Power Supply Unit |
DC / AC |
Deposition Source |
Sputtering Cathode 1EA, Thermal Source 2EA |
Target & Boat |
3" Target, 1/2” (w) x 2 (L) x 0.2 (T) Boat |
Film Thickness Uniformity |
Less than ±5% |
Ultimate Pressure |
Less than 5.0E-7Torr |
Specifications
ITEM |
SPECIFICATIONS |
Process Chamber |
Stainless steel |
Vacuum Pumping Station |
Turbo molecular pump |
Loadlock Chamber |
Stainless steel |
Substrate Heating Unit |
SiC / 4” |
Sample Loading/Unloading Unit |
Manual |
Pressure Control Unit |
Auto |
Vacuum Gauge Controller |
ATM ~ 1.0E-10Torr |
Gas Supply Unit |
MFC (Ar, O2, etc..) |
Power Supply Unit |
DC / AC |
Deposition Source |
Sputtering Cathode 1EA, Thermal Source 2EA |
Target & Boat |
3" Target, 1/2” (w) x 2 (L) x 0.2 (T) Boat |
Film Thickness Uniformity |
Less than ±5% |
Ultimate Pressure |
Less than 5.0E-7Torr |
Options
ITEM |
SPECIFICATIONS |
|||
Description |
Intelsi-LL |
Intelsi-LS1 |
Intelsi-LS2 |
Intelsi-LE |
Chamber |
SUS304, Circle type, Top door open |
|||
Dimensions |
M: 830(W) x 892(D) x 1150(H) |
|||
E-Beam Source |
Single pocket – 1.5cc |
N/A |
N/A |
4cc-6pockets/7cc- 4pockets |
E-Beam Power Supply |
3kW E-Beam power supply |
N/A |
N/A |
6kW E-Beam power supply |
Gas Supply |
Ar MFC control (Optional O2 MFC, N2 MFC) |
N/A |
||
Pressure Control |
Manual throttle valve (Optional Auto Throttle Valve) |
N/A |
||
Process |
Ultimate pressure : less than 5 x 10E-6 torr |
|||
Deposition Uniformity |
less than ±5% @ 2 inch |
less than ±5% @ 3 inch |
less than ±5% @ 3 inch |
|
Sputtering Source |
Target size : 1 inch |
Target: 1 inch – 3ea |
Target size : 3inch – 3ea |
N/A |
Sputtering Power Supply |
1kW RF Power Supply |
1kW DC Power Supply |
N/A |
|
Substrate |
Size : up to 4” piece |
up to 4” piece |
up to 4” piece |
|
Rotation Speed |
Rotation : 0 – 30 RPM |
|||
Heater |
Heating : up to 800°C by SiC heating element |
|||
System Control |
PLC based PC control |
|||
System Software |
Software : Labview |
|||
Thermal Source |
W boat or basket type |
N/A |
N/A |
N/A |
Thermal Power Supply |
3kW DC power supply |
N/A |
N/A |
N/A |
Utilities |
Electric Power : 220V, 3P, 30A |
|||
|
PCW : 1 ~ 2 kgf/cm2, 10 L/M |
|||
|
CDA : 6 ~ 7 kgf/cm2 |
|||
Vacuum Gauge |
PLC interface communication |
|||
Vacuum Pumping |
Turbo Molecular Pump + Rotary pump |
|||
Weight |
~ 300 kg (~660 pound ) |
Options
ITEM |
SPECIFICATIONS |
|||
Description |
Intelsi-LL |
Intelsi-LS1 |
Intelsi-LS2 |
Intelsi-LE |
Chamber |
SUS304, Circle type, Top door open |
|||
Dimensions |
M: 830(W) x 892(D) x 1150(H) |
|||
E-Beam Source |
Single pocket – 1.5cc |
N/A |
N/A |
4cc-6pockets/7cc- 4pockets |
E-Beam Power Supply |
3kW E-Beam power supply |
N/A |
N/A |
6kW E-Beam power supply |
Gas Supply |
Ar MFC control (Optional O2 MFC, N2 MFC) |
N/A |
||
Pressure Control |
Manual throttle valve (Optional Auto Throttle Valve) |
N/A |
||
Process |
Ultimate pressure : less than 5 x 10E-6 torr |
|||
Deposition Uniformity |
less than ±5% @ 2 inch |
less than ±5% @ 3 inch |
less than ±5% @ 3 inch |
|
Sputtering Source |
Target size : 1 inch |
Target: 1 inch – 3ea |
Target size : 3inch – 3ea |
N/A |
Sputtering Power Supply |
1kW RF Power Supply |
1kW DC Power Supply |
N/A |
|
Substrate |
Size : up to 4” piece |
up to 4” piece |
up to 4” piece |
|
Rotation Speed |
Rotation : 0 – 30 RPM |
|||
Heater |
Heating : up to 800°C by SiC heating element |
|||
System Control |
PLC based PC control |
|||
System Software |
Software : Labview |
|||
Thermal Source |
W boat or basket type |
N/A |
N/A |
N/A |
Thermal Power Supply |
3kW DC power supply |
N/A |
N/A |
N/A |
Utilities |
Electric Power : 220V, 3P, 30A |
|||
|
PCW : 1 ~ 2 kgf/cm2, 10 L/M |
|||
|
CDA : 6 ~ 7 kgf/cm2 |
|||
Vacuum Gauge |
PLC interface communication |
|||
Vacuum Pumping |
Turbo Molecular Pump + Rotary pump |
|||
Weight |
~ 300 kg (~660 pound )
|
System Control
Vacuum
This figure shows the pumping screen. This screen consists of each valve, pump action button, and automatic button. The biggest difference from Semi-Auto is the automatic button, so if you proceed with these buttons in sequence, one sample will be completed.
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|
|
Process The figure shows the process screen. This screen shows the buttons that control the gas flow rate, valve, power etc. required for the process. |
Graph The figure shows the graph screen. This screen shows vacuum degree, power amount and so on. You can record that data, make it into a file, and compare it with the previous data. |
|
|
Message The figure is a graph screen. The picture consists of status message and notification messages.
|
System Control
Vacuum
This figure shows the pumping screen. This screen consists of each valve, pump action button, and automatic button. The biggest difference from Semi-Auto is the automatic button, so if you proceed with these buttons in sequence, one sample will be completed.
|
|
|
Process The figure shows the process screen. This screen shows the buttons that control the gas flow rate, valve, power etc. required for the process. |
Graph The figure shows the graph screen. This screen shows vacuum degree, power amount and so on. You can record that data, make it into a file, and compare it with the previous data. |
|
|
Message The figure is a graph screen. The picture consists of status message and notification messages. |