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PLD VACUUM EQUIPMENTS

PLD (Pulsed Laser Deposition) is a physical deposition method that utilizes a high energy focused laser. Conceptually and experimentally.

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  • 제품 정보

    제품 상세설명

    Overview

     

    PLD (Pulsed Laser Deposition) is a physical deposition method that utilizes a high energy

     

    focused laser. Conceptually and experimentally. PLD is extremely simple. It consists of a

     

    target holder and a substrate holder housed in a vacuum chamber. A set of optical

     

    components focus and raster a high-power laser (the external source) into a

     

    concentrated beam over the target surface which vaporizes target materials to

     

    ultimately deposite thin film.

     

     

     

     

     

    Advantages

     

     Allows for the use of various targets and for the in-situ deposition of multi-layers

     

     Consists of simple hardware

     

     Simple system maintenance

     

     Various aspect of beam-target-substrate positioning

     

     Temperature uniformity of substrate

     

     Pyrometer Port

     

     Laser strength measurement port

     

     Ellipsometry port


    Overview

     

    PLD (Pulsed Laser Deposition) is a physical deposition method that utilizes a high energy

     

    focused laser. Conceptually and experimentally. PLD is extremely simple. It consists of a

     

    target holder and a substrate holder housed in a vacuum chamber. A set of optical

     

    components focus and raster a high-power laser (the external source) into a

     

    concentrated beam over the target surface which vaporizes target materials to

     

    ultimately deposite thin film.

     

     

     

     

     

    Advantages

     

     Allows for the use of various targets and for the in-situ deposition of multi-layers

     

     Consists of simple hardware

     

     Simple system maintenance

     

     Various aspect of beam-target-substrate positioning

     

     Temperature uniformity of substrate

     

     Pyrometer Port

     

     Laser strength measurement port

     

     Ellipsometry port


  • Specifications

    제품 Specifications

    Specifications

     

    ITEM

    SPECIFICATIONS

    UHV chamber Ultimate Pressure

    up to 5.0E-9Torr

    Two Chamber System

    Process chamber & Loadlock chamber

    Uniformity Zone of Substrate Heating

    Ø15 mm

    Substrate Temperature

    850°C ± 5°C in oxygen

    Operating Pressure

    0.01mTor ~ 10 Torr

    Target Carousel

    one inch (25.4mm) diameter for four targets

    Normal Angle of Incidence

    Laser beam on target : 45° with respect to target normal

    Loading type

    Easy to load or unload sample and target by magnetic transfer

    Option1

    RHEED (Reflection High-Energy Electron Diffraction)

    Option2

    CCD Camera for Oscillation of RHEED 

    Option3 

    Pyrometer for measuring substrate temperature   


    Specifications

     

    ITEM

    SPECIFICATIONS

    UHV chamber Ultimate Pressure

    up to 5.0E-9Torr

    Two Chamber System

    Process chamber & Loadlock chamber

    Uniformity Zone of Substrate Heating

    Ø15 mm

    Substrate Temperature

    850°C ± 5°C in oxygen

    Operating Pressure

    0.01mTor ~ 10 Torr

    Target Carousel

    one inch (25.4mm) diameter for four targets

    Normal Angle of Incidence

    Laser beam on target : 45° with respect to target normal

    Loading type

    Easy to load or unload sample and target by magnetic transfer

    Option1

    RHEED (Reflection High-Energy Electron Diffraction)

    Option2

    CCD Camera for Oscillation of RHEED 

    Option3 

    Pyrometer for measuring substrate temperature   

     

     

  • Options

  • Control

    제품 Control

     

    System Control


     Pumping

     The figure shows the pumping screen. Pumping 

     screens have valves and pumps. The pump and valve   are easily operated with one touch

    o_1bsmbsfsa1qtg17tn8gp1cu3rlva.png

    o_1bsmbsusq1ch21263p5s1bc61e3ka.png

    Servo

     

     The picture shows the servo screen. When you press the target button on this screen, target is rotated and you can see the target you selected. It also includes a target trigger function.

     Shutter

      This screen shows the shutter screen. There are   buttons on the screen  to operate the substrate     shutter, the gas valve, and the sputter gun shutter. 


    o_1bsmbugmi131k15pu1a3pqgp6efa.png

     

    o_1bsmbv0florqe4i1fp51fiaa4ha.png

       Gauge Control

     

        This screen shows the gauge control screen. There are buttons

        on the screen
     

      

    System Control


     Pumping

     The figure shows the pumping screen. Pumping 

     screens have valves and pumps. The pump and valve   are easily operated with one touch

    o_1bsmbsfsa1qtg17tn8gp1cu3rlva.png

    o_1bsmbsusq1ch21263p5s1bc61e3ka.png

    Servo

     

     The picture shows the servo screen. When you press the target button on this screen, target is rotated and you can see the target you selected. It also includes a target trigger function.

     Shutter

      This screen shows the shutter screen. There are   buttons on the screen  to operate the substrate     shutter, the gas valve, and the sputter gun shutter. 


    o_1bsmbugmi131k15pu1a3pqgp6efa.png

     o_1bsmbv0florqe4i1fp51fiaa4ha.png

       Gauge Control

     

        This screen shows the gauge control screen. There are buttons

        on the screen
     

  • 사용후기

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  • 상품문의

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    상품문의가 없습니다.

  • 배송/교환정보

    [배송]

    배송 안내 입력전입니다.

    [교환]

    교환/반품 안내 입력전입니다.

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  • KVP-2000L
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