KVC-P4000L > CVD
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제품 정보
제품 상세설명
Overview
Korea Vacuum Tech, Ltd. (KVT) is proud to introduce the latest revolutionary addition
to our product line, the CVD system. Chemical Vapor Deposition is a chemical reactive
process used to produce high-purity, high-performance solid materials in a vacuum state.
In a typical CVD process, the wafer (substrate) is exposed to one or more volatile precursors
which react and / or decompose on the substrate surface to produce a desired deposit.
Plasma Enhanced Chemical Vapor Deposition (PECVD) is a unique form of the CVD
process used primarily to deposit thin films from a gaseous state (vapor) to a solid state
on some substrate. PECVD is not dependent upon thermal energy alone to create of
maintain a chemical reaction but rather it uses RF-enhanced glow discharge to convey
energy to a reactive gas which subsequently, in a vacuum environment, sets the
conditions necessary for effective thin film deposition.
Features
≻ Compared to other CVD application, PECVD allows for operations in
a high-vacuum, low-temp environment
≻ Specially designed gas shower head provides uniform gas flow – consistent
film thickness over a surface
≻ Can distribute multiple gases, independently about the substrate and mixed
outside of gas shower head
≻ Semi – or Fully- Automate processing available
≻ Capable of multi-layer, co-deposition processing
≻ High deposition rates-fast!
Overview
Korea Vacuum Tech, Ltd. (KVT) is proud to introduce the latest revolutionary addition
to our product line, the CVD system. Chemical Vapor Deposition is a chemical reactive
process used to produce high-purity, high-performance solid materials in a vacuum state.
In a typical CVD process, the wafer (substrate) is exposed to one or more volatile precursors
which react and / or decompose on the substrate surface to produce a desired deposit.
Plasma Enhanced Chemical Vapor Deposition (PECVD) is a unique form of the CVD
process used primarily to deposit thin films from a gaseous state (vapor) to a solid state
on some substrate. PECVD is not dependent upon thermal energy alone to create of
maintain a chemical reaction but rather it uses RF-enhanced glow discharge to convey
energy to a reactive gas which subsequently, in a vacuum environment, sets the
conditions necessary for effective thin film deposition.
Features
≻ Compared to other CVD application, PECVD allows for operations in
a high-vacuum, low-temp environment
≻ Specially designed gas shower head provides uniform gas flow – consistent
film thickness over a surface
≻ Can distribute multiple gases, independently about the substrate and mixed
outside of gas shower head
≻ Semi – or Fully- Automate processing available
≻ Capable of multi-layer, co-deposition processing
≻ High deposition rates-fast!
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Specifications
제품 Specifications
Specifications
ITEM
SPECIFICATIONS
Processs Chamber
Material : SUS304 / Anodized Al6061
Loadlock Chamber
KVC-X000L Series available
Vacuum Pumping Station
TMP & Dry Pump
Gas shower Head
Shower Head with insulator/RF bias electrode isolation
Pressure Control
Auto Throttle Valve & CDG Sensor
Substrate Heating Type
- Heating element size: 4” ~ 6”
- Heating element type: SiC, Molded
Gas Supply Unit
Mass Flow Controller & valve
Plasma Source
RF generator with matching network
Process control
KVC-P4000
KVC-P4000L
KVC-P2000
KVC-P2000L
PC Control
By Labview
PC Control
By Labview
Semi-Auto
Semi-Auto
Specifications
ITEM
SPECIFICATIONS
Processs Chamber
Material : SUS304 / Anodized Al6061
Loadlock Chamber
KVC-X000L Series available
Vacuum Pumping Station
TMP & Dry Pump
Gas shower Head
Shower Head with insulator/RF bias electrode isolation
Pressure Control
Auto Throttle Valve & CDG Sensor
Substrate Heating Type
- Heating element size: 4” ~ 6”
- Heating element type: SiC, Molded
Gas Supply Unit
Mass Flow Controller & valve
Plasma Source
RF generator with matching network
Process control
KVC-P4000
KVC-P4000L
KVC-P2000
KVC-P2000L
PC Control
By Labview
PC Control
By Labview
Semi-Auto
Semi-Auto
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Options
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Control
제품 Control
System Control
Vacuum
This screen shows the vacuum screen. This
screen consists of each valve, pump action button,
automatic button. The automatic function provides
convenience to the user. if you proceed with these
buttons in sequence, one sample will be completed.
Recipe
The figureshows the recipe screen. This screen contains
boxes for entering the process conditions required
for deposition. Input all the boxes and press the
Process button to automatically deposit according to
the input process conditions.
Process
The figure shows the process screen. This screen
shows the buttons that can control the gas flow
rate, valve, power etc. required for the process.
Transfer
The figure shows the Transfer screen. In this screen,
there are buttons that allow you to manipulate the part
you will use to move samples from the load lock chamber
to the process chamber, such as the loading arm, z-
motion.
Graph
The figure shows the graph screen. This screen
shows vacuum degree, power amount, deposition
rate, thickness and so on. You can record that
data and make it into a file and compare it with
the previous data.
Message
The picture is a graph screen. The picture consists of
status message notification messages
System Control
Vacuum
This screen shows the vacuum screen. This
screen consists of each valve, pump action button,
automatic button. The automatic function provides
convenience to the user. if you proceed with these
buttons in sequence, one sample will be completed.
Recipe
The figureshows the recipe screen. This screen contains
boxes for entering the process conditions required
for deposition. Input all the boxes and press the
Process button to automatically deposit according to
the input process conditions.
Process
The figure shows the process screen. This screen
shows the buttons that can control the gas flow
rate, valve, power etc. required for the process.
Transfer
The figure shows the Transfer screen. In this screen,
there are buttons that allow you to manipulate the part
you will use to move samples from the load lock chamber
to the process chamber, such as the loading arm, z-
motion.
Graph
The figure shows the graph screen. This screen
shows vacuum degree, power amount, deposition
rate, thickness and so on. You can record that
data and make it into a file and compare it with
the previous data.
Message
The picture is a graph screen. The picture consists of
status message notification messages
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사용후기
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상품문의
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배송/교환정보
[배송]
배송 안내 입력전입니다.[교환]
교환/반품 안내 입력전입니다.
선택된 옵션
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KVC-P4000L+0원
