Overview
Korea Vacuum Tech, Inc. (KVT) is proud to introduce the latest revolutionary addition to our product line, the CVD system. Chemical Vapor Deposition is a chemical reactive process used to produce high –purity, high performance solid materials in a vacuum state. In a typical CVD process, the water(substrate) is exposed to one or more volatile precursors which react and / or decompose on the substrate surface to produce a desired deposit. Thermal Chemical Vapor Deposition(Thermal CVD) is a unique form of the CVD process used primarily to deposit thin lms from a gaseous state(Vapor) to a solid state on some substrate. Thermal CVD is dependent upon thermal energy to create of maintain a chemical reaction.
Features
≻ 3 Zone Furnace for temperature up to 1000℃
≻ Sample size : up to 2”
≻ Easy to sample loading & unloading by loading bar
≻ 3” dia. Quartz Tube
≻ Operation pressure ~ 1Torr
≻ No water cooling
Overview
Korea Vacuum Tech, Inc. (KVT) is proud to introduce the latest revolutionary addition to our product line, the CVD system. Chemical Vapor Deposition is a chemical reactive process used to produce high –purity, high performance solid materials in a vacuum state. In a typical CVD process, the water(substrate) is exposed to one or more volatile precursors which react and / or decompose on the substrate surface to produce a desired deposit. Thermal Chemical Vapor Deposition(Thermal CVD) is a unique form of the CVD process used primarily to deposit thin lms from a gaseous state(Vapor) to a solid state on some substrate. Thermal CVD is dependent upon thermal energy to create of maintain a chemical reaction.
Features
≻ 3 Zone Furnace for temperature up to 1000℃
≻ Sample size : up to 2”
≻ Easy to sample loading & unloading by loading bar
≻ 3” dia. Quartz Tube
≻ Operation pressure ~ 1Torr
≻ No water cooling
Specifications
ITEM |
SPECIFICATIONS |
Dimension |
1990(W) x 850(D) x 1200 (H) |
Weight |
250 kg |
Loading bar |
Sample retract & extend |
Substrate |
Size : Piece to 2 inch |
Temperature |
Heating: up to 1000℃ on substrate Three zone controlled furnace |
Vacuum Pumping |
Rotary pump |
Vacuum Gauge |
Convection gauge |
Gas Supply |
Ar, H2, CH4, N2 MFC |
Pressure control |
Auto throttle valve & CDG sensor |
Specifications
ITEM |
SPECIFICATIONS |
Dimension |
1990(W) x 850(D) x 1200 (H) |
Weight |
250 kg |
Loading bar |
Sample retract & extend |
Substrate |
Size : Piece to 2 inch |
Temperature |
Heating: up to 1000℃ on substrate Three zone controlled furnace |
Vacuum Pumping |
Rotary pump |
Vacuum Gauge |
Convection gauge |
Gas Supply |
Ar, H2, CH4, N2 MFC |
Pressure control |
Auto throttle valve & CDG sensor |
System Control
Pumping The figure shows the pumping screen. Pumping screens have valves and pumps. The pump and valve are easily operated with one touch. |
|
|
Interlock This picture shows the interlock screen. Basically, the interlock is set so that it does not work when you deviate from the correct method of use for your safety. |
System Control
Pumping
The figure shows the pumping screen. Pumping screens have valves and pumps. The pump and valve are easily operated with one touch. |
|
|
Interlock This picture shows the interlock screen. Basically, the interlock is set so that it does not work when you deviate from the correct method of use for your safety. |