KVET-B2000L > ETHCHER
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제품 정보
제품 상세설명
Overview
Ion-Beam etching is a versatile process for pattern delineation and material modification.
The low pressure, line-of-sight nature of beam techniques provides a flexibility of
directional bombardment not available in other plasma processes. The ability to etch
virtually any material by the sputtering process opens a wide variety of diverse
applications.
Features
≻ High selectivity, uniform plasma
≻ Simple configuration makes maintenance easy
≻ The physical and chemical etching systems are controlled independently
≻ Low damage & contamination
≻ Physical etching using Ar Ion-Beam distributes reactive gases such as Cl2, He, BCl3 evenly around substrate.
Overview
Ion-Beam etching is a versatile process for pattern delineation and material modification.
The low pressure, line-of-sight nature of beam techniques provides a flexibility of
directional bombardment not available in other plasma processes. The ability to etch
virtually any material by the sputtering process opens a wide variety of diverse
applications.
Features
≻ High selectivity, uniform plasma
≻ Simple configuration makes maintenance easy
≻ The physical and chemical etching systems are controlled independently
≻ Low damage & contamination
≻ Physical etching using Ar Ion-Beam distributes reactive gases such as Cl2, He, BCl3 evenly around substrate.
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Specifications
제품 Specifications
Specifications
ITEM
SPECIFICATIONS
System configuration
R&D
Substrate size
2” - 6” (50.8mm - 150mm)
Operation pressure (Torr)
> 1.0E-4 Torr
Uniformity within substrate /
substrate to substrate surfaces
± 5% max
Ion source
3cm ~ 20scm (@1” ~ 8”)
Substrate
Tilt / Rotation / Cooling
Ultimate Pressure
1.0E-6Torr
Specifications
ITEM
SPECIFICATIONS
System configuration
R&D
Substrate size
2” - 6” (50.8mm - 150mm)
Operation pressure (Torr)
> 1.0E-4 Torr
Uniformity within substrate /
substrate to substrate surfaces
± 5% max
Ion source
3cm ~ 20scm (@1” ~ 8”)
Substrate
Tilt / Rotation / Cooling
Ultimate Pressure
1.0E-6Torr
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Options
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Control
제품 Control
System Control
Pumping
The figure shows the pumping screen. Pumping screens
have valves and pumps. The pump and valve are easily
operated with one touch.
Process Control
This picture shows the substrate tilt, shutter, rotation,
gas valve control screen.
Interlock
This picture shows the interlock screen. Basically, the
nterlock is set so that it does not work when you deviate
from the correct method of use for your safety.
System Control
Pumping
The figure shows the pumping screen. Pumping screens
have valves and pumps. The pump and valve are easily
operated with one touch.
Process Control
This picture shows the substrate tilt, shutter, rotation,
gas valve control screen.
Interlock
This picture shows the interlock screen. Basically, the
nterlock is set so that it does not work when you deviate
from the correct method of use for your safety.
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사용후기
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상품문의
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배송/교환정보
[배송]
배송 안내 입력전입니다.[교환]
교환/반품 안내 입력전입니다.
선택된 옵션
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KVET-B2000L+0원
