By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

This indium deposition machine is a high-vacuum deposition system for high-reliability packaging and interface formation of superconducting devices.

By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

By harnessing the superior stability and higher critical temperature of Niobium, the JDR-S series delivers the ultimate sputtering solution for fabricating highly reliable Josephson junctions.

With free control of the ion beam incidence angle and a real-time monitoring system, it enables precise etching profiles even in complex nanostructures and minimizes sample damage.

It is a hybrid system combining thin-film deposition (sputtering) and precision etching functions for the fabrication of nanostructures of Josephson devices, forming the optimal oxide interface that determines the performance of superconducting quantum devices.

A cluster system capable of mass production at once, realizing stable system operation and reproducibility