Overview
"Eliminate unnecessary frills and make core performance more powerful."
We have drastically reduced the cost burden and elevated the inherent thin film deposition performance of sputtering to a new level.
Features
≻ Excellent Thickness Uniformity
The KVS Series RF&DC Sputtering System provide excellent thickness uniformity of resultant films even for substrates that have the same diameter as the sputtering cathode assembly
≻ No loadlock chamber
≻ Semi-auto system control by PLC
Overview
"Eliminate unnecessary frills and make core performance more powerful."
We have drastically reduced the cost burden and elevated the inherent thin film deposition performance of sputtering to a new level.
Features
≻Excellent Thickness Uniformity
The KVS Series RF&DC Sputtering System provide excellent thickness uniformity of resultant films even for substratesthat have the same diameter as the sputtering cathode assembly
≻No loadlock chamber
≻Semi-auto system control by PLC
Specifications
|
ITEM
|
SPECIFICATIONS
|
|
Process Chamber
|
Stainless steel
|
|
Vacuum Pumping Station
|
Turbo molecular pump
|
|
|
|
|
Substrate Heating Unit
|
SiC / 2”
|
|
|
|
|
Pressure Control Unit
|
Manual / Semi-Automatic
|
|
Vacuum Gauge Controller
|
ATM ~ 1.0E-10Torr
|
|
Gas Supply Unit
|
MFC (Ar, O2, N2, H2, etc..)
|
|
Power Supply Unit
|
RF / DC / Pulsed DC
|
|
Target Size
|
2”
|
|
Film Thickness Uniformity
|
Less than ± 4.99 %
|
|
Ultimate Pressure
|
Less than 1.99E-6 Torr
|
Specifications
|
ITEM
|
SPECIFICATIONS
|
|
Process Chamber
|
Stainless steel
|
|
Vacuum Pumping Station
|
Turbo molecular pump
|
|
|
|
|
Substrate Heating Unit
|
SiC / 2”
|
|
|
|
|
Pressure Control Unit
|
Manual / Semi-Automatic
|
|
Vacuum Gauge Controller
|
ATM ~ 1.0E-10Torr
|
|
Gas Supply Unit
|
MFC (Ar, O2, N2, H2, etc..)
|
|
Power Supply Unit
|
RF / DC / Pulsed DC
|
|
Target Size
|
2”
|
|
Film Thickness Uniformity
|
Less than ± 4.99 %
|
|
Ultimate Pressure
|
Less than 1.99E-6 Torr
|
Options
- Power Selection
- Automatic Control
- Etc... user requirements
Options
- Power Selection
- Automatic Control
- Etc... user requirements