Sputter Deposition System [KVS-1000] > Sputter
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Sputter Deposition System [KVS-1000] 요약정보 및 구매

Lowest price, high performance sputtering system(가장 합리적인 가격의 고성능 스퍼터 시스템)

This is a sputter system that eliminates unnecessary frills and enhances the functionality of the most practical parts.

- 2" Substrate
- 2" Sic Heater
- 2" Magnetron Sputter gun

목록
  • 제품 정보

    제품 상세설명

    Overview

     

    "Eliminate unnecessary frills and make core performance more powerful." 

    We have drastically reduced the cost burden and elevated the inherent thin film deposition performance of sputtering to a new level.

     

    Features


    Excellent Thickness Uniformity

            The KVS Series RF&DC Sputtering System provide excellent thickness uniformity of resultant films even for substrates that have the same diameter as the sputtering cathode assembly

      ≻ No loadlock chamber

      ≻ Semi-auto system control by PLC

    Overview

     

    "Eliminate unnecessary frills and make core performance more powerful." 

    We have drastically reduced the cost burden and elevated the inherent thin film deposition performance of sputtering to a new level.

     

    Features


    Excellent Thickness Uniformity

            The KVS Series RF&DC Sputtering System provide excellent thickness uniformity of resultant films even for substratesthat have the same diameter as the sputtering cathode assembly

      ≻No loadlock chamber

      ≻Semi-auto system control by PLC

  • Specifications

    제품 Specifications

    Specifications

     

    ITEM

    SPECIFICATIONS

    Process Chamber

    Stainless steel

    Vacuum Pumping Station

    Turbo molecular pump


    Substrate Heating Unit

    SiC / 2”



    Pressure Control Unit

    Manual / Semi-Automatic

    Vacuum Gauge Controller

    ATM ~ 1.0E-10Torr

    Gas Supply Unit

    MFC (Ar, O2, N2, H2, etc..)

    Power Supply Unit

    RF / DC / Pulsed DC

    Target Size

    2”

    Film Thickness Uniformity

    Less than ± 4.99 %

    Ultimate Pressure

    Less than 1.99E-6 Torr


    Specifications

     

    ITEM

    SPECIFICATIONS

    Process Chamber

    Stainless steel

    Vacuum Pumping Station

    Turbo molecular pump


    Substrate Heating Unit

    SiC / 2”



    Pressure Control Unit

    Manual / Semi-Automatic

    Vacuum Gauge Controller

    ATM ~ 1.0E-10Torr

    Gas Supply Unit

    MFC (Ar, O2, N2, H2, etc..)

    Power Supply Unit

    RF / DC / Pulsed DC

    Target Size

    2”

    Film Thickness Uniformity

    Less than ± 4.99 %

    Ultimate Pressure

    Less than 1.99E-6 Torr


  • Options

    제품 Options

    Options

     

    - Power Selection

    - Automatic Control

    - Etc... user requirements

    Options

     

    - Power Selection

    - Automatic Control

    - Etc... user requirements

  • Control

  • 사용후기

    등록된 사용후기

    사용후기가 없습니다.

  • 상품문의

    등록된 상품문의

    상품문의가 없습니다.

  • 배송/교환정보

    [배송]

    배송 안내 입력전입니다.

    [교환]

    교환/반품 안내 입력전입니다.

선택된 옵션

  • Sputter Deposition System [KVS-1000]
    +0원

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