By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

By harnessing the superior stability and higher critical temperature of Niobium, the JDR-S series delivers the ultimate sputtering solution for fabricating highly reliable Josephson junctions.

Ion beam etching is a microfabrication process essential for fabricating Josephson junctions. Josephson junctions, which involve nanometer-thick insulating and superconducting layers, require extreme precision. Ion beam etching selectively removes only unnecessary components, creating a clean and uniform junction surface and optimizing intermetal contact characteristics to ensure stable supercurrent flow. This precision processing technology is a key enabler for high-performance qubit implementation and large-scale quantum chip fabrication.

By seamlessly integrating a pristine glovebox environment with high-vacuum sputtering, the RVSG-2000L provides the definitive platform for fabricating next-generation perovskite solar cells.

By seamlessly integrating E-beam and Sputtering into a single high-vacuum chamber, the Multi-Function PVD System delivers the ultimate In-situ solution for fabricating ultra-pure, multi-layer devices without interfacial contamination.

INTELSI SYSTEM VACUUM EQUIPMENTS

INTELSI SYSTEM VACUUM EQUIPMENTS

E-beam&Sputter Series

OLED R&D Series

OLED R&D Series

OLED R&D Series

SPUTTER VACUUM EQUIPMENTS

SPUTTER VACUUM EQUIPMENTS

SPUTTER VACUUM EQUIPMENTS

SPUTTER VACUUM EQUIPMENTS

RTP VACUUM EQUIPMENTS

RTP VACUUM EQUIPMENTS

KVR-4000 Series

KVR-2000 Series

Generally, R-HEED operate only in ultra-high vacuum (UHV) conditions due to the nature of electrons. However, a relatively high oxygen partial pressure (High Pressure) environment is essential for growing high-quality oxide thin films on PLD. The High Pressure RHEED, developed to perfectly resolve this contradiction, utilizes differential pumping technology. It is designed to safely maintain an ultra-high vacuum inside the electron gun while maintaining high oxygen pressure within the chamber where the thin film grows. This allows for real-time (in-situ) monitoring of the oxide thin film growth process, ensuring that the moment is not missed.

PLD VACUUM EQUIPMENTS

PLD VACUUM EQUIPMENTS

Thermal CVD Series

PECVD Series

PECVD Series

ALD-CVD Series

PEALD

VACUUM DRYER for LiB

Bench Top RTP Series

Bench Top Sputter Series

Ion Milling Series

RIE Series

RIE Series

ICP-RIE Series

Vacuum Pump Oil