By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

This indium deposition machine is a high-vacuum deposition system for high-reliability packaging and interface formation of superconducting devices.

By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

By harnessing the superior stability and higher critical temperature of Niobium, the JDR-S series delivers the ultimate sputtering solution for fabricating highly reliable Josephson junctions.

By seamlessly integrating a pristine glovebox environment with high-vacuum Evaporator Thermal, the RVTG-4000 provides the definitive platform for fabricating next-generation perovskite solar cells.

Glovebox Integrated Sputtering System By seamlessly integrating a pristine glovebox environment with high-vacuum sputtering, the RVSG-2000L provides the definitive platform for fabricating next-generation perovskite solar cells.

By seamlessly integrating E-beam and Sputtering into a single high-vacuum chamber, the Multi-Function PVD System delivers the ultimate In-situ solution for fabricating ultra-pure, multi-layer devices without interfacial contamination.

E-beam&Sputter Series

OLED R&D Series

OLED R&D Series

OLED R&D Series

This equipment is a high-performance sputtering system capable of stably depositing Au/Pt metals up to 100 nm, as well as sample pretreatment for SEM analysis.

The most basic sputtering system

Basic sputtering system configured with a loadlock chamber

Sputtering system optimized for research purposes

RTP VACUUM EQUIPMENTS

RTP VACUUM EQUIPMENTS

KVR-4000 Series

KVR-2000 Series

Generally, R-HEED operate only in ultra-high vacuum (UHV) conditions due to the nature of electrons. However, a relatively high oxygen partial pressure (High Pressure) environment is essential for growing high-quality oxide thin films on PLD. The High Pressure RHEED, developed to perfectly resolve this contradiction, utilizes differential pumping technology. It is designed to safely maintain an ultra-high vacuum inside the electron gun while maintaining high oxygen pressure within the chamber where the thin film grows. This allows for real-time (in-situ) monitoring of the oxide thin film growth process, ensuring that the moment is not missed.

PLD VACUUM EQUIPMENTS

The most basic PLD system

Thermal CVD Series

PECVD Series

PECVD Series

ALD-CVD Series

PEALD

VACUUM DRYER for LiB

Ion Milling Series

RIE Series

RIE Series

ICP-RIE Series

함침 도가니에 대한 자세한 설명은 다음을 참고 하여 주십시오.(https://blog.naver.com/korea_vacuum_tech)

진공 오일 네오박 MR-200 1리터 제품에 대한 자세한 설명은 다음을 참고 하여 주십시오. (https://blog.naver.com/korea_vacuum_tech/224235559555)