By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

CLUSTER SPUTTER VACUUM EQUIPMENTS

Thermal Indium Series

By maximizing the unique properties of aluminum, the JDR-E series delivers the ultimate hardware solution for producing top-tier Josephson junctions.

By seamlessly integrating a pristine glovebox environment with high-vacuum Evaporator Thermal, the RVTG-4000 provides the definitive platform for fabricating next-generation perovskite solar cells.

Glovebox Integrated Sputtering System By seamlessly integrating a pristine glovebox environment with high-vacuum sputtering, the RVSG-2000L provides the definitive platform for fabricating next-generation perovskite solar cells.

By seamlessly integrating E-beam and Sputtering into a single high-vacuum chamber, the Multi-Function PVD System delivers the ultimate In-situ solution for fabricating ultra-pure, multi-layer devices without interfacial contamination.

INTELSI SYSTEM VACUUM EQUIPMENTS

INTELSI SYSTEM VACUUM EQUIPMENTS

E-beam&Sputter Series

OLED R&D Series

OLED R&D Series

OLED R&D Series

Josephson junction fabrication requires extreme precision, and ion beam etching and sputtering are key processes for achieving this. Ion beam etching selectively removes unnecessary film to ensure a clean and uniform bonding surface, while sputtering deposits a precise and uniform film of superconducting metals such as neodymium (Nb) or aluminum (Al). Our integrated vacuum system is designed to perform these two processes continuously within a single chamber. Contamination is minimized by eliminating sample exposure to the atmosphere between processes. This system simultaneously meets the stability, precision, and efficiency demands of researchers and industrial sites, providing the optimal solution for the development of next-generation superconducting quantum computers.

CLUSTER SPUTTER VACUUM EQUIPMENTS

SPUTTER VACUUM EQUIPMENTS

SPUTTER VACUUM EQUIPMENTS

RTP VACUUM EQUIPMENTS

RTP VACUUM EQUIPMENTS

KVR-4000 Series

KVR-2000 Series

Generally, R-HEED operate only in ultra-high vacuum (UHV) conditions due to the nature of electrons. However, a relatively high oxygen partial pressure (High Pressure) environment is essential for growing high-quality oxide thin films on PLD. The High Pressure RHEED, developed to perfectly resolve this contradiction, utilizes differential pumping technology. It is designed to safely maintain an ultra-high vacuum inside the electron gun while maintaining high oxygen pressure within the chamber where the thin film grows. This allows for real-time (in-situ) monitoring of the oxide thin film growth process, ensuring that the moment is not missed.

PLD VACUUM EQUIPMENTS

PLD VACUUM EQUIPMENTS

Thermal CVD Series

PECVD Series

PECVD Series

ALD-CVD Series

PEALD

VACUUM DRYER for LiB

Bench Top RTP Series

Bench Top Sputter Series

Ion Milling Series

RIE Series

RIE Series

ICP-RIE Series

Vacuum Pump Oil